This is a utility for generating mask layers from a layout. Data is read in using standard EDA formats (GDSII, CIF, or DXF), combined using standard operations (union, intersection, difference, and XOR), and exported back to an EDA format.
A command-line utility for converting EDA formats used in creating masks between different formats.
A library with a C++ API to read and write common EDA formats used in creating mask layouts.